產(chǎn)品介紹：

        MJb4型號(hào)紫外光刻機(jī)是德國(guó)SUSS公司生產(chǎn)的手動(dòng)型光刻機(jī)，在全球相關(guān)科研領(lǐng)域的實(shí)驗(yàn)室有廣泛的應(yīng)用。該設(shè)備配備可靠的在亞微米級(jí)高度精密的對(duì)準(zhǔn)以及高分辨光刻系統(tǒng)。具備頂部對(duì)準(zhǔn)系統(tǒng)和衍射減小光學(xué)系統(tǒng)。

Perfect Low-Cost Solution:

?  High Accuracy

?  Good Optical performance

?  latest processes (e.g. UV-NIL)

Addressed Markets:

?  MEMS

?  Telecommunications

?  Compound Semiconductors

?  Nano Imprint Lithography

Manual Tool: Easy To Operate

Technical Data

?  Wafer size: 1′′ up to 100 mm / 4′′ (round)

?  Min. pieces: 5 x 5 mm

?  Wafer thickness: up to 4 mm

?  Mask size: standard 2′′ x 2′′ up to 5′′ x 5′′ (SEMI)

?  Mask thickness: up to 4.8 mm / 190 mil

Exposure Modes

?  Contact: soft, hard, vacuum, soft vacuum

?  Proximity up to 50μm gap

Optics

?  UV250, UV300, UV400 and broadband optics

?  Intensity Uniformity ± 3% on 100mm

?  Constant power or constant intensity

?  Lamp sizes: 200W, 350W, 500W (for UV250)

?  Resolution down to 0,5 μm L/S (vacuum contact, UV250)

Alignment

?  TSA alignment accuracy: 0.5μm (with SUSS recommended wafer targets)

?  Transmitted IR Alignment accuracy: < 5μm (<2μm under special process conditions)

?  Alignment gap:10–50μm

Single or splitfield microscope with/w/o CCD camera